Performance Optimization of Amorphous IGZO Field‑effect Transistors Fabricated Using Pulsed Laser Deposition

MEI Jiawang, LI Tiaoyang

RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS ›› 2025, Vol. 45 ›› Issue (1) : 0.

PDF(696 KB)
PDF(696 KB)
RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS ›› 2025, Vol. 45 ›› Issue (1) : 0. DOI: 10.12450/j.gtdzx.202501011

Performance Optimization of Amorphous IGZO Field‑effect Transistors Fabricated Using Pulsed Laser Deposition

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2025, 45(1): 0 https://doi.org/10.12450/j.gtdzx.202501011

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(696 KB)

Accesses

Citation

Detail
Sections
Recommended
Copyright © RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS, All Rights Reserved.
Powered by Beijing Magtech Co. Ltd,.

/

〈 〉