Design and Implementation of High Temperature Resistant Short Channel Device Based on 0.15 μm SOI Process

GU Xiang, ZHANG Qingdong, JI Xuming, LI Jinghang, CHANG Ruiheng

RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS ›› 2024, Vol. 44 ›› Issue (3) : 258-263.

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RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS ›› 2024, Vol. 44 ›› Issue (3) : 258-263. DOI: 10.12450/j.gtdzx.202403013
Device & Material & Technology

Design and Implementation of High Temperature Resistant Short Channel Device Based on 0.15 μm SOI Process

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 44(3): 258-263 https://doi.org/10.12450/j.gtdzx.202403013

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